Process control of photoresist undercut for lift-off patterns below 100 nm

Process control of photoresist undercut for lift-off patterns below 100 nm

Author(s):

Louis, E. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

Zoethout, E. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

van de Kruijs, R. W. E. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

Nedelcu, I. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

Yakshin, A. E. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

van der Westen, S. Alonso ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

Tsarfati, T. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

Bijkerk, F. ( FOM Institute for Plasma Physics Rijnhuizen (Netherlands) )

Enkisch, H. ( Carl Zeiss SMT AG (Germany) )

Mullender, S. ( Carl Zeiss SMT AG (Germany) )

5 more

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

601

Page(to):

608

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

Similar Items:

1 Conference Proceedings Enhanced performance of EUV multilayer coatings [5900-02] Louis, F., Yakshin, A. E., Zoethout, E., van de Kruijs, R. W. E., Nedelcu, I., van der Westen, S. A., Tsarfati, T., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Smoothing properties of single- and multilayer coatings: a method to smoothen substrates A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Alonso van der Westen, F. Bijkerk Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition A. E. Yakshin, R. W. E. de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, H. Enkisch, S. Mullender SPIE - The International Society of Optical Engineering	8 Conference Proceedings Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB[6151-18] Laubis, C., Buchholz, C., Fischer, A., Ploger, S., Scholz, F., Wagner, H., Scholze, F., Ulm, G., Enkisch, H., Mullender, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Substrate recovery layers for EUVL optics: effects on multilayer reflectivity and surface roughness I. Nedelcu, R. W. E. de Kruijs, A. E. Yakshin, E. Louis, F. Bijkerk, S. Mullender SPIE - The International Society of Optical Engineering	9 Conference Proceedings Coatings for next generation lithography C. Zaczek, S. Müllender, H. Enkisch, F. Bijkerk Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Subatomic accuracy in EUVL multilayer coatings Zoethout, E., Suter, P., van de Kruijs, R.W., Yakshin, A.E., Louis, E., Bijkerk, F., Enkisch, H., Muellender, S. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Advanced metal lift-off process using electron-beam flood exposure of single-layer photoresist Minter, J. P., Ross, M. F., Livesay, W. R., Wong, S. S., Narcy, M. E., Marlowe, T. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Multilayer optics with spectral purity layers for the EUV wavelength range [6151-155] Louis, E., Van de Kruijs, R. W. E, Yakshin, A. E., Van der Westen, S. A, Bijkerk, F., Van Herpen, M. M. J. W., Klunder, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Progress in Mo/Si multilayer coating technology for EUVL optics Louis,E., Yakshin,A.E., Gorts,P.C., Oestreich,S., Stuik,R., Maas,E.L.G., Kessels,M.J.H., Bijkerk,F., Haidl,M., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Stress mitigation in Mo/Si multilayers for EUV lithography Zoethout, E., Sipos, G., Kruijs, R.W., Yakshin, A.E., Louis, E., Muellender, S., Bijkerk, F. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Mo/Si multiiayer coating technology for EUVL: coating uniformity and time stabllity Louis,E., Yakshin,A.E., Gorts,P.C., Oestreich,S., Maas,E.L.G., Kessels,M.J.H., Schmitz,D., Scholze,F., Ulm,G., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12