The effect of debris on collector optics, its mitigation and repair: next-step a gaseous Sn EUV DPP source

The effect of debris on collector optics, its mitigation and repair: next-step a gaseous Sn EUV DPP source

Author(s):

Oizumi, H. ( Association of Super-Advanced Electronics Technologies (Japan) )

Yamanashi, H. ( Association of Super-Advanced Electronics Technologies (Japan) )

Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )

Hashimoto, K. ( Japan Advanced Instifute of Science and Technology (Japan) )

Ohsono, S. ( Japan Advanced Instifute of Science and Technology (Japan) )

Masuda, A. ( Japan Advanced Instifute of Science and Technology (Japan) )

Izumi, A. ( Japan Advanced Instifute of Science and Technology (Japan) )

Matsumura, H. ( Japan Advanced Instifute of Science and Technology (Japan) )

3 more

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

572

Page(to):

577

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

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