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Preliminary study on systematic optimization of EPL mask infrastructure

Author(s):
Takase, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Gomei, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Terashima, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Kondo, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Aoki, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Matsunari, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Niibe, M. ( Univ. of Hyogo (Japan) )
Kakutani, Y. ( Univ. of Hyogo (Japan) )
3 more
Publication title:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5751
Pub. Year:
2005
Page(from):
509
Page(to):
517
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
Language:
English
Call no.:
P63600/5751-1
Type:
Conference Proceedings

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