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Mask fabrication towards sub-10 nm imprint lithography

Author(s):
Jung, G. Y. ( Hewlett-Packard Labs. (USA) )
Wu, W. ( Hewlett-Packard Labs. (USA) )
Li, Z. ( Hewlett-Packard Labs. (USA) )
Wang, S. Y. ( Hewlett-Packard Labs. (USA) )
Tong, W. M. ( Hewlett-Packard Labs. (USA) and The Hewlett-Packard Co. (USA) )
Williams, R. S. ( Hewleft-Parkard Labs. (USA) )
1 more
Publication title:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5751
Pub. Year:
2005
Page(from):
382
Page(to):
391
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
Language:
English
Call no.:
P63600/5751-1
Type:
Conference Proceedings

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