Complexity reduction for C4 compression for implementation in maskless lithography datapath

Complexity reduction for C4 compression for implementation in maskless lithography datapath

Author(s):

Klunder, D. J. W. ( Philips Research (Netherlands) )
van Herpen, M. M. J. W. ( Philips Research (Netherlands) )
Banine, V. Y. ( ASML (Netherlands) )
Gielissen, K. ( Technical Univ. Eindhoven (Netherlands) )

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

366

Page(to):

381

Pages:

16

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

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