Maskless EUV lithography via optically addressed modulator

Maskless EUV lithography via optically addressed modulator

Author(s):

Teramoto, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Sato, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Bessho, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Niimi, G. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Shirai, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yamatani, D. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Takemura, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yokoto, T. ( Ushio Inc. (Japon) )

Paul, K. C. ( Ushio Inc. (Japon) )

Kabuki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Miyauchi, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ikeuchi, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hotta, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yoshioka, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Toyoda, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

10 more

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

349

Page(to):

354

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

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