EUV focus sensor: design and modeling
- Author(s):
Hoffman, J. R. ( Cymer, Inc. (USA) ) Bykanov, A. N. ( Cymer, Inc. (USA) ) Khodykin, O. V. ( Cymer, Inc. (USA) ) Ershov, A. I. ( Cymer, Inc. (USA) ) Bowering, N. R. ( Cymer, Inc. (USA) ) Fomenkov, I. V. ( Cymer, Inc. (USA) ) Partlo, W. N. ( Cymer, Inc. (USA) ) Myers, D. W. ( Cymer, Inc. (USA) ) - Publication title:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5751
- Pub. Year:
- 2005
- Page(from):
- 312
- Page(to):
- 319
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- Language:
- English
- Call no.:
- P63600/5751-1
- Type:
- Conference Proceedings
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