Characterization of flare on Intel's EUV MET

Characterization of flare on Intel's EUV MET

Author(s):

Fleurov, V. B. ( Cymer, Inc. (USA) )
Oh, P. C. ( Cymer, Inc. (USA) )
Steiger, T. D. ( Cymer, Inc. (USA) )
Fomenkov, I. V. ( Cymer, Inc. (USA) )
Partlo, W. N. ( Cymer, Inc. (USA) )

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

293

Page(to):

300

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

Similar Items:

1 Conference Proceedings XLR 500i: recirculating ring ArF light source for immersion lithography D. W. Brown, P. O'Keeffe, V. B. Fleurov, R. Rokitski, R. Bergstedt, I. V. Fomenkov, K. O'Brien, N. R. Farrar, W. N. … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Performance of very high repetition rate ArF lasers Hueber,J.-M., Besaucele,H., Das,P.P., Eis,R., Ershov,A.I., Fleurov,V.B., Gaidarenko,D., Hofmann,T., Melcher,P.C., … SPIE - The International Society for Optical Engineering
2 Conference Proceedings EUV(13.5-nm)light generation using a dense plasma focus device Partlo,W.N., Fomenkov,I.V., Birx,D.L. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-ｦﾌm line widths Ershov,A.I., Hofmann,T., Partlo,W.N., Fomenkov,I.V., Everage,G., Das,P.P., Myers,D. SPIE-The International Society for Optical Engineering
3 Conference Proceedings LPP EUV source development for HVM D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Bowering, A. N. Bykanov, G. O. Vaschenko, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Progress toward use of a dense plamsa focus as a light source for production EUV lithography Partlo,W.N., Fomenkov,I.V., Ness,R.M., Oliver,R.I., Melnychuk,S.T., Rauch,J.E. SPIE-The International Society for Optical Engineering
4 Conference Proceedings High-power low cost drive laser for LPP source [6151-137] Fomenkov, I V., Hanssaon, B. A. M., Boering, N. R., Ershov, A. I., Partlo, W. N., Fleurov, V. B., Khodykin, O. V., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Laser-produced plasma source system development D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings EUV focus sensor: design and modeling Hoffman, J. R., Bykanov, A. N., Khodykin, O. V., Ershov, A. I., Bowering, N. R., Fomenkov, I. V., Partlo, W. N., Myers, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Optimization of a dense plasma focus device as a light source for EUV lithography Fomenkov, I.V., Partlo, W.N., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Development of an EUV(13.5 nm)light source employing a dense plasma focus in lithium vapor Partlo,W.N., Fomenkov,I.V., Oliver,R., Birx,D.L. SPIE - The International Society for Optical Engineering	12 Conference Proceedings EUV source collector [6151-131] Bowering N R, Ershov A I, Marx W F, Khodykin O V, Hansson B A M, Vargas E, Chavez L J A, Fomenkov I V, Myers D W, Brandt … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12