High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL
- Author(s):
Nagai, K. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Gu, Q. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Norimatsu, T. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Nishimura, H. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Fujioka, S. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Tao, Y. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Okuno, T. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Nishihara, K. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Miyanaga, N. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) Izawa, Y. ( Institute of Laser Engineering, Osaka Univ. (Japan) ) - Publication title:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5751
- Pub. Year:
- 2005
- Page(from):
- 279
- Page(to):
- 292
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- Language:
- English
- Call no.:
- P63600/5751-1
- Type:
- Conference Proceedings
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