Performance of kilowatt-class laser modules in scaling up laser produced plasma (LPP) EUV source
- Author(s):
Komori, H. ( Extreme Ultraviolet Lithography System Deveiopment Association (Japan) ) Imai, Y. ( Extreme Ultraviolet Lithography System Deveiopment Association (Japan) ) Soumagne, G. ( Extreme Ultraviolet Lithography System Deveiopment Association (Japan) ) Abe, T. ( Extreme Ultraviolet Lithography System Deveiopment Association (Japan) ) Suganuma, T. ( Extreme Ultraviolet Lithography System Deveiopment Association (Japan) ) Endo, A. ( Extreme Ultraviolet Lithography System Deveiopment Association (Japan) ) - Publication title:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5751
- Pub. Year:
- 2005
- Page(from):
- 272
- Page(to):
- 278
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- Language:
- English
- Call no.:
- P63600/5751-1
- Type:
- Conference Proceedings
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