EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

Author(s):

Stamm, U. ( XTREME technologies (Germany) )

Kleinschmidt, J. ( XTREME technologies (Germany) )

Gabel, K. ( XTREME technologies (Germany) )

Hergenhan, G. ( XTREME technologies (Germany) )

Ziener, C. ( XTREME technologies (Germany) )

Ahmad, I. ( XTREME technologies (Germany) )

Bolshukhin, D. ( XTREME technologies (Germany) )

Korobotchko, V. ( XTREME technologies (Germany) )

Keller, A. ( XTREME technologies (Germany) )

Geier, A. ( XTREME technologies (Germany) )

Ringling, J. ( XTREME technologies (Germany) )

Tran, C. D. ( XTREME technologies (Germany) )

Mader, B. ( XTREME technologies (Germany) )

de Bruijn, R. ( XTREME technologies (Germany) )

Gotze, S. ( XTREME technologies (Germany) )

Brudermann, J. ( XTREME technologies (Germany) )

Schriever, G. ( XTREME technologies (Germany) )

12 more

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

236

Page(to):

247

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

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