EUV microexposures at the ALS using the 0.3-NA MET projection optics

EUV microexposures at the ALS using the 0.3-NA MET projection optics

Author(s):

Jeon, Y.-D. ( Hanyang Univ. (South Korea) )
Choi, M.-K. ( Hanyang Univ. (South Korea) )
Kim, E.-J. ( Hanyang Univ. (South Korea) )
Kim, J.-S. ( Hanyang Univ. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

56

Page(to):

63

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014972
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 9th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.03

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