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Surface morphology and recrystallization behavior of amorphous Si after ArF laser-irradiation

Author(s):
Chen, T.T. ( Chung Cheng Institute of Technology (Taiwan) )
Chang, C.Y. ( Chung Cheng Institute of Technology (Taiwan) )
Chao, C.L. ( Tam-Kang Univ. (Taiwan) )
Ma, K.J. ( Chung-Hua Univ. (Taiwan) )
Liu, Y.M. ( Chung Cheng institute of Technology (Taiwan) )
Chen, Y.T. ( Chung Cheng institute of Technology (Taiwan) )
Lin, C.W. ( Ta-Tung Univ. (Taiwan) )
2 more
Publication title:
Photon Processing in Microelectronics and Photonics IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5713
Pub. Year:
2005
Page(from):
82
Page(to):
89
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456878 [081945687X]
Language:
English
Call no.:
P63600/5713
Type:
Conference Proceedings

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