Formation of polycrystalline-silicon-germanium films by pulsed laser-induced rapid annealing

Formation of polycrystalline-silicon-germanium films by pulsed laser-induced rapid annealing

Author(s):

Watakabe, H. ( Tokyo Univ. of Agriculture and Technology(Japan) )
Sameshima, T. ( Tokyo Univ. of Agriculture and Technology(Japan) )
Kanno, H. ( Kyushu Univ. (Japan) )
Sadoh, T. ( Kyushu Univ. (Japan) )
Miyao, M. ( Kyushu Univ. (Japan) )

Publication title:

Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5662

Pub. Year:

2004

Page(from):

426

Page(to):

431

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819456236 [0819456233]

Language:

English

Call no.:

P63600/5662

Type:

Conference Proceedings

Details

TDL ID:	ZA00014879
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Laser Precision Microfabrication
Conf. info. (Number):	2004 : 5th
Conf. info. (Venue):	Nara, Japan
Conf. info. (Date):	2004.05.11-2004.05.14

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