Blank Cover Image

Using the aerial image measurement technique to speed up mask development for 193-nm immersion and polarization lithography

Author(s):
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. Year:
2004
Page(from):
223
Page(to):
232
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Aerial image measurement technique for fast evaluation of 193-nm lithography masks

Zibold, A.M., Scheruebl, T., Harnisch, W., Brunner, R., Greif, J.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Aerial image measurement system for 157-nm lithography

Eisner, K., Kuschnerus, P., Urbach, J.-P., Schilz, C.M., Engel, T., Zibold, A.M., Yasui, T., Higashikawa, I.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Aerial image measurement technique for today's and future 193-nm lithography mask requirements

Zibold, A. M., Scherubl, T., Menck, A., Brunner, R., Greif, J.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings EUV mask simulation for AIMS

Windpassinger, R., Rosenkranz, N., Scherubl, T., Evanschitzky, P., Erdmann, A., Zibold, A.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Printability study with polarization based AIMS fab 193i to investigate mask polarization effects [6281-11]

Zibold, A., Stroessner, U., Poortinga, E., Schmid, R., Scherubl, T, Rosenkranz, N., Harnisch, W.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs

Zibold, A.M., Schmid, R.M., Stegemann, B., Scheruebl, T., Harnisch, W., Kobiyama, Y.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Performance of the aerial image measurement system for 157-nm lithography

Kuschnerus, P., Engel, T., Harnisch, W., Hertfelder, C., Zibold, A.M., Urbach, J.-P., Schilz, C.M., Eisner, K.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Actinic aerial image measurement tool for 157-nm mask qualification

Yasui, T., Higashikawa, I., Kuschnerus, P., Engel, T., Zibold, A.M., Hertfelder, C., Kobiyama, Y., Urbach, J.-P., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion [5853-131]

Zibold, A. M., Poortinga, E., Doornmalen, H. v., Schmid, R., Scherubl, T., Harnisch, W.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements

Zibold, A. M., Schmid, R., Bohm, K., Brunner, R., Durr, A. C.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]

Zibold, A., Stroessner, U., Ridley, A., Scherubl, T., Rosenkranz, N., Harnisch, W., Poortinga, E., Schmid, R., Bekaert, …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Actinic aerial image measurement tool for 157-nm lithography

Kuschnerus, P., Engel, T., Zibold, A.M., Hertfelder, C., Yasui, T., Higashikawa, I., Schilz, C.M., Semmler, A.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12