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Exposure dose control for step-and-scan lithography

Author(s):
  • Guo, L. ( Shanghai Institute of Optics and Fine Mechanics (China) and Graduate School of the Chinese Academy of Sciences (China) )
  • Huang, H. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Wang, X. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Zhang, D. ( Shanghai Institute of Optics and Fine Mechanics (China) and Graduate School of the Chinese Academy of Sciences (China) )
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. Year:
2004
Page(from):
217
Page(to):
222
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

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