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Advanced 2D structures metrology with CD-SEM for OPC challenges

Author(s):
Kris, R. ( Applied Materials Israel Ltd. (Israel) )
Tam, A. ( Applied Materials Israel Ltd. (Israel) )
Peltinov, R. ( Applied Materials Israel Ltd. (Israel) )
Menadeva, O. ( Applied Materials Israel Ltd. (Israel) )
Adan, O. ( Applied Materials Israel Ltd. (Israel) )
Wertsman, N. ( Applied Materials Israel Ltd. (Israel) )
Vilenkin, A. ( Hebrew Univ. of Jerusalem (Israel) )
2 more
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. Year:
2004
Page(from):
130
Page(to):
141
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

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