Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology

Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology

Author(s):

Tzu, S.-D. ( Remarkable, Ltd. (Hong Kong China) )

Chang, C.-H. ( Remarkable, Ltd. (Hong Kong China) )

Chen, W.-C. ( Remarkable, Ltd. (Hong Kong China) )

Kliem, K.-H. ( Leica Microsystems Lithography GmbH (Germany) )

Hudek, P. ( Leica Microsystems Lithography GmbH (Germany) )

Beyer, D. ( Leica Microsystems Lithography GmbH (Germany) )

1 more

Publication title:

Advanced microlithography technologies : 8-10 November, 2004, Beijing, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5645

Pub. Year:

2004

Page(from):

100

Page(to):

108

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819456007 [0819456004]

Language:

English

Call no.:

P63600/5645

Type:

Conference Proceedings

Details

TDL ID:	ZA00014861
Series ID:	PA00000029
Conf. info. (Name):	Photonics Asia : Advanced microlithography technologies
Conf. info. (Number):	2004
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2004.11.08-2004.11.10

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