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Photomask development for 90-nm technology

Author(s):
Zhang, Y. ( Photronics, Inc. (USA) )
Cattle, R. ( Photronics, Inc. (USA) )
Mackay, S. ( Photronics, Inc. (USA) )
Xiao, G. ( Photronics, Inc. (USA) )
Unruh, J. ( Photronics, Inc. (USA) )
Progler, C. J. ( Photronics, Inc. (USA) )
1 more
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. Year:
2004
Page(from):
94
Page(to):
99
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

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