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Method of printing 100-nm random interconnect pattern with alt-PSM

Author(s):
  • Lu, J. ( Institute of Microelectronics, CAS (China) )
  • Chen, B. ( Institute of Microelectronics, CAS (China) )
  • Liu, M. ( Institute of Microelectronics, CAS (China) )
  • Kang, X. ( Institute of Microelectronics, CAS (China) )
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. Year:
2004
Page(from):
55
Page(to):
62
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

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