Novel contact hole reticle design for enhanced lithography process window in IC manufacturing

Novel contact hole reticle design for enhanced lithography process window in IC manufacturing

Author(s):: Chang, C.-H. ( Remarkable Ltd. (Hong Kong China) )
Publication title:: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5645
Pub. Year:: 2004
Page(from):: 32
Page(to):: 43
Pages:: 12
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819456007 [0819456004]
Language:: English
Call no.:: P63600/5645
Type:: Conference Proceedings

Details

TDL ID:	ZA00014861
Series ID:	PA00000029
Conf. info. (Name):	Photonics Asia : Advanced microlithography technologies
Conf. info. (Number):	2004
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2004.11.08-2004.11.10

Similar Items:

1 Conference Proceedings Novel contact hole reticle design for enhanced lithography process window in IC manufacturing Chang, C. -H. SPIE - The International Society of Optical Engineering	7 Conference Proceedings 0.13-/0.15-μm production reticle process window qualification procedure for 200-mm manufacturing fab Chang, Z.-W., Wu, C.-M., Mo, M., Shieh, C.-C., Cheng, D.S., Chen, C.-C., Yang, R.Y., Randall, D.W., Yu, W.-C. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Effect of hole shape error on lithography process window Kumar,R., Mukherjee-Roy,M., Tan,C.-H. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Contact hole photo process improvement by multiple exposures with matched illumination settings Yen, Y.-S., Huang, I-H., Hwang, J.-R., Hung, K.-C., Ku, C.-F., Chang, C.-H., Fang, C.-Y., Yen, P.W. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology Jiang, Z., Sorkhabi, O., Chu, H., Cao, X.L., Li, G., Wen, Y., Opsal, J.L., Chang, Y.-C. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Lithography performance of contact holes:II.Simulation of effects of reticle corner rounding on wafer print performance Mack,C.A., Sauer,C.A., Chabala,J.M. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Lithography process window enhancement using integrated design defect detection and fix [6283-100] Su, B., Ma, M., Vikram, A., Volk, W., Du, H., Verma, G., Morse, R., Chu, C., Tsao, B., Lin, C., Chou, J., Tsai, S. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Ion projection lithography for IC manufacturing Ehrmann,A., Loschner,H., Kasmaier,R. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Shot noise and process window study for printing small contact holes using EUV lithography Lee, S.H., Bristol, R.L., Bjorkholm, J.E. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Utilization of assisting features in contact-hole mask repair Chang,C.-Y., Chang,C.-H., Lin,C.-Y., Hung,C.-C., Lin,C.-H., Lin,J.C.H. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring [5992-141] Su, B., Verma, G., Wolk, W., Ahmadian, M., Du, H., Vikram, A., Andrews, S., Cheng, Y. F., Chou, Y. L., Yang, C. H., Lin, … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes Kang,D., Robertson,S.A., Reilly,M.T., Pavelchek,E.K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12