Extraction of exposure modeling parameters of thick resist
- Author(s):
Liu, C. ( Sichuan Univ. (China) ) Du, J. ( Sichuan Univ. (China) ) Liu, S. ( Shanxi Univ. of Technology (China) ) Duan, X. ( Sichuan Univ. (China) ) Luo, B. ( Sichuan Univ. (China) ) Zhu, J. ( Sichuan Univ. (China) ) Guo, Y. ( Sichuan Univ. (China) ) Du, C. ( State Key Lab. of Optical Technology on Microfabrication, CAS (China) ) - Publication title:
- MEMS/MOEMS Technologies and Applications II
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5641
- Pub. Year:
- 2004
- Page(from):
- 333
- Page(to):
- 343
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455963 [0819455962]
- Language:
- English
- Call no.:
- P63600/5641
- Type:
- Conference Proceedings
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