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Defect printability and inspection of EUVL mask

Author(s):
Lu, B. ( Freescale Semiconductor, Inc. (USA) )
Wasson, J. R. ( Freescale Semiconductor, Inc. (USA) )
Mangat, P. J. S. ( Motorola Labs. (USA) )
Cobb, J. L. ( Freescale Semiconductor, Inc. (USA) )
Hector, S. D. ( Freescale Semiconductor, Inc. (USA) )
Pettibone, D. W. ( KLA-Tencor Corp. (USA) )
O'Connell, D. ( Sandia National Labs. (USA) )
2 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1425
Page(to):
1434
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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