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Analysis of in-field uniformity on wafer considering exposure margin and MEEF

Author(s):
Cha, B. -C. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S. -Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S. -H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yu, S. -Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Jeon, C. -U. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, H. -S. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W. -S. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1368
Page(to):
1376
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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