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Defect inspection and repair performance on CPL masks for 90- and 65-nm node line patterns

Author(s):
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kojima, K. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hashimoto, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Yoshida, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
2 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1339
Page(to):
1348
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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