Practical LEEPL masks for sub-65-nm node

Practical LEEPL masks for sub-65-nm node

Author(s):

Yotsui, K. ( Toppan Printing Co., Ltd. (Japan) )
Sumida, T. ( Toppan Printing Co., Ltd. (Japan) )
Negishi, Y. ( Toppan Printing Co., Ltd. (Japan) )
Yoshii, T. ( Toppan Printing Co., Ltd. (Japan) )
Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

1268

Page(to):

1277

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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