Thermodynamic study of photomask plasma etching
- Author(s):
- Wu, B. ( Photronics Inc. (USA) )
- Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 1195
- Page(to):
- 1206
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-2
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source
MRS - Materials Research Society |
4
Conference Proceedings
Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
5
Conference Proceedings
Plasma etching of Cr photomasks: optimization of process conditions and CD control
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
PLASMA ETCHING OF PLT THIN FILMS AND BULK PLZT USING FLUORINE- AND CHLORINE-BASED GASES
Materials Research Society |
Materials Research Society |
12
Conference Proceedings
(697a) The Applications of Thermodynamic Approach to Select Viable Chemistry in Plasma Etching
American Institute of Chemical Engineers |