Closing the defect printability loop: optimizing defect specifications for an established lithographic process
- Author(s):
Patterson, K. ( Freescale Semiconducteurs Ctr. de Recherches Crolles SAS (France) ) Wakefield, C. ( Photronics, Inc. (United Kingdom) ) Sixt, P. ( Photronics, Inc. (France) ) Sundermann, F. ( STMicroelectronics (France) ) Trouiller, Y. ( CEA-LETI (France) ) Belledent, J. ( Philips Semiconductors (France) ) Couderc, C. ( Philips Semiconductors (France) ) Rody, Y. ( Philips Semiconductors (France) ) Lucas, K. ( Freescale Semiconducteurs Ctr. de Recherches Crolles SAS (France) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 1076
- Page(to):
- 1082
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-2
- Type:
- Conference Proceedings
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