Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Author(s):

Chung, D. -H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Matsumura, K. ( NEC Corp. (Japan) )

Tojo, T. ( Toshiba Corp. (Japan) )

Otaki, M. ( Toppan Printing Co., Ltd. (Japan) )

1 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

993

Page(to):

1004

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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