Absorber stack optimization toward EUV lithography mask blank pilot production

Absorber stack optimization toward EUV lithography mask blank pilot production

Author(s):

Sobel, F. ( Schott Lithotec AG (Germany) )

Aschke, L. ( Schott Lithotec AG (Germany) )

Renno, M. ( Schott Lithotec AG (Germany) )

Seitz, H. ( Schott Lithotec AG (Germany) )

Becker, H. W. ( Schott Lithotec AG (Germany) )

Olschewski, N. ( Schott Lithotec AG (Germany) )

Reichardt, T. ( Schott Lithotec AG (Germany) )

Hess, G. ( Schott Lithotec AG (Germany) )

Buttgereit, U. ( Schott Lithotec AG (Germany) )

Knapp, K. ( Schott Lithotec AG (Germany) )

Letzkus, F. ( Institut fur Mikroelektronik Stuttgart (Germany) )

Butschke, J. ( Institut fur Mikroelektronik Stuttgart (Germany) )

Koepernik, C. ( Institut fur Mikroelektronik Stuttgart (Germany) )

8 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

781

Page(to):

790

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

Similar Items:

1 Conference Proceedings Production challenges of making EUV mask blanks Seitz, H., Sobel, F., Renno, M., Leutbecher, T., Olschewski, N., Reichardt, T., Walter, R., Becker, H., Buttgereit, U., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM Becker, H. W., Schley, P., Schmidt, F., Sobel, F., Renno, M., Olschewski, N., Seitz, H., Buttgereit, U., Knapp, K., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber Sobel, F., Aschke, L., Rueggeberg, F., Seitz, H., Olschewski, N., Reichhardt, T., Becker, H., Renno, M., Kirchner, S., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Production challenges of making an EUV mask blank(Invited Paper) Aschke, L., Becker, H. W., Friemel, F., Leutbecher, T., Olschewski, N., Renno, M., Ruggeberg, F., Schiffler, M., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Update on the EUVL mask blank activity at Schott Lithotec Sobel, F., Aschke, L., Becker, H.W., Renno, M., Ruggeberg, F., Kirchner, S., Leutbecher, T., Olschewski, N., Schiffler, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19] Becker, H., Renno, M., Hermanns, U., Seitz, H., Buttgereit, U., Knapp, K., Hess, G. SPIE - The International Society of Optical Engineering
4 Conference Proceedings High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition Becker, H.W., Sobel, F., Aschke, L., Renno, M., Krieger, J., Buttgereit, U., HeB, G., Lenzen, F., Knapp, K., Yulin, … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Dry etch behavior of different TaN absorber layers for EUVL mask making F. Letzkus, G. Hess, M. Irmscher, K. Knapp, M. Renno, E. Roehrle, H. Seitz SPIE - The International Society of Optical Engineering
5 Conference Proceedings EUVl mask blanks: recent results on substrates, multilayers, and the dry-etch process of TaN-absorbers [6151-09] Seitz, H., Renno, M., Leutbecher, T., Olschewski, N., Reichardt, T., Walter, R., Popp, H., HeB, G., Letzkus, F., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography Becker, H.W., Chey, J., Sobel, F., Schmidt, F., Renno, M., Buttgereit, U., Angelopoulos, M., Hess, G., Knapp, K. SPIE - The International Society of Optical Engineering
6 Conference Proceedings SiO2 buffer-etch processes with a TaN absorber for EUV mask fabrication Letzkus, F., Butschke, J., Koepernik, C., Holfeld, C., Mathuni, J., Aschke, L., Sobel, F. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography Becker, H.W., Schmidt, F., Sobel, F., Renno, M., Buttgereit, U., Chey, J., Angelopoulos, M., Knapp, K., Hess, G. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12