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Full-chip-model-based correction of flare-induced linewidth variation

Author(s):
Word, J. ( Mentor Graphics Corp. (USA) )
Belledent, J. ( Philips Semiconductors (France) )
Trouiller, Y. ( STMicroelectronics (France) )
Maurer, W. ( Mentor Graphics Corp. (USA) )
Granik, Y. ( Mentor Graphics Corp. (USA) )
Sahouria, E. ( Mentor Graphics Corp. (USA) )
Toublan, O. ( Mentor Graphics Corp. (USA) )
2 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
700
Page(to):
710
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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