Contact and via hole mask design optimization for 65-nm technology node

Contact and via hole mask design optimization for 65-nm technology node

Author(s):

Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Socha, R. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Laidig, T. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Hollerbach, U. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Wampler, K. E. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Hsu, S. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Chen, J. F. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Corcoran, N. P. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Dusa, M. V. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

Park, J. C. ( ASML MaskTools, Inc. (USA) and ASML Technology Development Ctr. (USA) )

6 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

680

Page(to):

690

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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