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Mask topography effect in chromeless phase lithography

Author(s):
Philipsen, V. ( IMEC vzw (Belgium) )
Bekaert, J. ( IMEC vzw (Belgium) )
Vandenberghe, G. ( IMEC vzw (Belgium) )
Jonckheere, R. ( IMEC vzw (Belgium) )
Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )
Socha, R. ( ASML Technology Development Ctr. (USA) )
1 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
669
Page(to):
679
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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