New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM
- Author(s):
Becker, H. W. ( Schott Lithotec AG (Germany) ) Schley, P. ( Schott Lithotec AG (Germany) ) Schmidt, F. ( Schott Lithotec AG (Germany) ) Sobel, F. ( Schott Lithotec AG (Germany) ) Renno, M. ( Schott Lithotec AG (Germany) ) Olschewski, N. ( Schott Lithotec AG (Germany) ) Seitz, H. ( Schott Lithotec AG (Germany) ) Buttgereit, U. ( Schott Lithotec AG (Germany) ) Knapp, K. ( Schott Lithotec AG (Germany) ) Hess, G. ( Schott Lithotec AG (Germany) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 659
- Page(to):
- 668
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19]
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Absorber stack optimization toward EUV lithography mask blank pilot production
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |