Development of a complementary phase-shift mask process for 90-nm node technology

Development of a complementary phase-shift mask process for 90-nm node technology

Author(s):

Wang, R. ( Freescale Semiconductor, Inc. (USA) )
Philbin, C. ( Freescale Semiconductor, Inc. (USA) )
Fu, C. -C. ( Freescale Semiconductor, Inc. (USA) )
Wilkinson, B. ( Freescale Semiconductor, Inc. (USA) )

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

575

Page(to):

586

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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