Next-generation DUV ALTA mask patterning capabilities

Next-generation DUV ALTA mask patterning capabilities

Author(s):

Allen, P. C. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Christenson, E. R. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Hamaker, H. C. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Howells, S. C. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Kenan, B. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Pirogovsky, P. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Sadiq, M. K. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Teitzel, R. L. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

White, M. C. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Ungureit, M. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Wickstrom, A. ( Etec Systems, Inc., an Applied Materials Co. (USA) )

Kiefer, R. ( DuPont Photomasks, Inc. (USA) )

Jackson, C. ( DuPont Photomasks, Inc. (USA) )

8 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

279

Page(to):

290

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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