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Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Author(s):
Tu, Y. ( Simon Fraser Univ. (Canada) )
Chapman, G. H. ( Simon Fraser Univ. (Canada) )
Dykes, J. ( Simon Fraser Univ. (Canada) )
Poon, D. ( Simon Fraser Univ. (Canada) )
Choo, C. ( Simon Fraser Univ. (Canada) )
Peng, J. ( Simon Fraser Univ. (Canada) )
1 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
245
Page(to):
256
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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