Accelerating yield ramp through design and manufacturing collaboration
- Author(s):
- Sarma, R. C. ( Cadence Design Systems, Inc. (USA) )
- Dai, H. ( Applied Materials, Inc. (USA) )
- Smayling, M. C. ( Applied Materials, Inc. (USA) )
- Duane, M. P. ( Applied Materials, Inc. (USA) )
- Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 128
- Page(to):
- 136
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-1
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
On the Electronic Design and the Performance of a Ramp Generator for a Pulsed Low Energy Positron Beam
Trans Tech Publications |