Blank Cover Image

Mask defect inspection study with high-speed mask inspection system

Author(s):
  • Jun, J. ( Hynix Semiconductor Inc. (South Korea) )
  • Kim, H. ( Hims Co., Ltd. (South Korea) )
  • Choi, S. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, Y. K. ( Hynix Semiconductor Inc. (South Korea) )
  • Han, O. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
64
Page(to):
71
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Novel mask inspection flow for better defect review and analysis [6283-107]

Lim, K., Park, H. J., Chung, H. D., Choi, W. S., Han, S. W., Takizawa, H., Miyazaki, K.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings The study to enhance the accuracy of FIB repair on mask pattern of DRAM [6152-94]

Choi, Y., Kim, H., Kim, S., Han, O.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

S. H. Han, J. H. Park, D. H. Chung, S.-G. Woo, H. K. Cho

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Simulation and experiments for inspection properties of EUV mask defects [6283-85]

Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Investigation of Cr defect in high Cr load logic mask

Jung, H.-Y., Choi, S.J., Kim, M.-S., Lee, D.W., Lee, J., Han, O.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication [5992-09]

Kim, D. Y., Cho, W. I., Park, J. H., Chung, D. H., Cha, B. C., Choi, S. W., Han, W. S., Park, K. H., Kim, N. W., Hess, …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Comparative evaluation of mask production CAR development processes with stepwise defect inspection

Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Impact of mask defect in a high MEEF process

Jeong, C.-Y., Park, K.-Y., Choi, J.S., Lee, J.G., Lee, D.-H.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]

Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks

Cho,H.-J., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Defects analysis of mask blanks

Lee,D.H., Kim,D.W., Lee,J.K., Jeong,W.G., Choi,S.-S., Jung,S.-M., Jeong,S.-H.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Actinic EUVL mask blank defect inspection system

Jeong,S., Johnson,L.E., Lin,Y., Rekawa,S., Yan,P., Kearney,P.A., Tejnil,E., Underwood,J.H., Bokor,J.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12