High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma
- Author(s):
- Nakano, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
- Abe, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
- Endo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
- Publication title:
- X-ray sources and optics : 2-3 August 2004, Denver, Colorado, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5537
- Pub. Year:
- 2004
- Page(from):
- 1
- Page(to):
- 10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819454751 [0819454753]
- Language:
- English
- Call no.:
- P63600/5537
- Type:
- Conference Proceedings
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