Recent progress of EUV wavefront metrology in EUVA

Recent progress of EUV wavefront metrology in EUVA

Author(s):

Hasegawa, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ouchi, C. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hasegawa, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Kato, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ohkubo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Suzuki, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Sugisaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Okada, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Otaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Murakami, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Saito, J. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Niibe, M. ( Univ. of Hyogo (Japan) )

Takeda, M. ( Univ. of Electro-Communications (Japan) )

8 more

Publication title:

Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5533

Pub. Year:

2004

Page(from):

27

Page(to):

36

Pages:

10

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454713 [0819454710]

Language:

English

Call no.:

P63600/5533

Type:

Conference Proceedings

Details

TDL ID:	ZA00014734
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Application
Conf. info. (Number):	2004 : 2nd
Conf. info. (Venue):	Denver, CO, USA
Conf. info. (Date):	2004.08.05

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