High-aspect ratio grating fabrication by imprint lithography

High-aspect ratio grating fabrication by imprint lithography

Author(s):

Hirai, Y. ( Osaka Prefecture Univ. (Japan) )
Konishi, T. ( Osaka Prefecture Univ. (Japan) )
Kanakugi, T. ( Osaka Prefecture Univ. (Japan) )
Kawata, H. ( Osaka Prefecture Univ. (Japan) )
Kikuta, H. ( Osaka Prefecture Univ. (Japan) )

Publication title:

Nanoengineering: fabrication, properties, optics, and devices : 4-6 August, 2004, Denver, Colorado

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5515

Pub. Year:

2004

Page(from):

187

Page(to):

194

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454539 [0819454532]

Language:

English

Call no.:

P63600/5515

Type:

Conference Proceedings

Details

TDL ID:	ZA00014716
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Nanoengineering
Conf. info. (Number):	2004
Conf. info. (Venue):	Denver, CO, USA
Conf. info. (Date):	2004.08.04-2004.08.06

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