Shaped beam technology for nano-imprint mask lithography

Shaped beam technology for nano-imprint mask lithography

Author(s):

Hudek, P. ( Leica Microsystems Lithography GmbH(Germany) )

Beyer, D. ( Leica Microsystems Lithography GmbH(Germany) )

Groves, T. R. ( Leica Microsystems Lithography GmbH(Germany) )

Fortagne, O. K. ( Leica Microsystems Lithography GmbH(Germany) )

Dauksher, W. J. ( Motorola(USA) )

Mancini, D. P. ( Motorola(USA) )

Nordquist, K. J. ( Motorola(USA) )

Resnick, D. J. ( Motorola(USA) )

3 more

Publication title:

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5504

Pub. Year:

2004

Page(from):

204

Page(to):

208

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454379 [0819454370]

Language:

English

Call no.:

P63600/5504

Type:

Conference Proceedings

Details

TDL ID:	ZA00014705
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2004 : 20th
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2004.01.12-2004.01.14

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