Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z

Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z

Author(s):

Plontke, R. ( Leica Microsystems Lithography GmbH(Germany) )

Bettin, L. ( Leica Microsystems Lithography GmbH(Germany) )

Beyer, D. ( Leica Microsystems Lithography GmbH(Germany) )

Butschke, J. ( Institut fur Mikroelektronik Stuttgart(Germany) )

Irmscher, M. ( Institut fur Mikroelektronik Stuttgart(Germany) )

Koepernik, C. ( Institut fur Mikroelektronik Stuttgart(Germany) )

Leibold, B. ( Institut fur Mikroelektronik Stuttgart(Germany) )

Vix, A. B. E. ( Infineon Technologies AG(Germany) )

Voehringer, P. ( Institut fur Mikroelektronik Stuttgart(Germany) )

4 more

Publication title:

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5504

Pub. Year:

2004

Page(from):

188

Page(to):

196

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454379 [0819454370]

Language:

English

Call no.:

P63600/5504

Type:

Conference Proceedings

Details

TDL ID:	ZA00014705
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2004 : 20th
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2004.01.12-2004.01.14

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