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Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Author(s):
Pforr, R. ( Infineon Technologies AG(Germany) )
Dettmann, W. ( Infineon Technologies AG(Germany) )
Eisenhut, M. ( Infineon Technologies AG(Germany) )
Hennig, M. ( Infineon Technologies AG(Germany) )
Hofmann, D. ( Infineon Technologies AG(Germany) )
Thiele, J. ( Infineon Technologies AG(Germany) )
Thielscher, G. ( Infineon Technologies AG(Germany) )
2 more
Publication title:
20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5504
Pub. Year:
2004
Page(from):
178
Page(to):
187
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819454379 [0819454370]
Language:
English
Call no.:
P63600/5504
Type:
Conference Proceedings

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