Production challenges of making an EUV mask blank(Invited Paper)

Production challenges of making an EUV mask blank(Invited Paper)

Author(s):

Aschke, L. ( Schott Lithotec AG(Germany) )

Becker, H. W. ( Schott Lithotec AG(Germany) )

Friemel, F. ( Schott Lithotec AG(Germany) )

Leutbecher, T. ( Schott Lithotec AG(Germany) )

Olschewski, N. ( Schott Lithotec AG(Germany) )

Renno, M. ( Schott Lithotec AG(Germany) )

Ruggeberg, F. ( Schott Lithotec AG(Germany) )

Schiffler, M. ( Schott Lithotec AG(Germany) )

Schmidt, F. ( Schott Lithotec AG(Germany) )

Sobel, F. ( Schott Lithotec AG(Germany) )

Walter, K. ( Schott Lithotec AG(Germany) )

Heβ, G. ( Schott Lithotec AG(Germany) )

Lenzen, F. ( Schott Lithotec AG(Germany) )

Knapp, K. ( Schott Lithotec AG(Germany) )

Alkemper, J. ( Schott Glas(Germany) )

Hack, H. ( Schott Glas(Germany) )

Megges, K. ( Schott Glas(Germany) )

Mitra, I. ( Schott Glas(Germany) )

Muller, R. ( Schott Glas(Germany) )

Nolte, U. ( Schott Glas(Germany) )

Schumacher, J. ( Schott Glas(Germany) )

Pannhorst, W. ( Schott Glas(Germany) )

17 more

Publication title:

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5504

Pub. Year:

2004

Page(from):

94

Page(to):

104

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454379 [0819454370]

Language:

English

Call no.:

P63600/5504

Type:

Conference Proceedings

Details

TDL ID:	ZA00014705
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2004 : 20th
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2004.01.12-2004.01.14

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