January 2004 update on the SEMI standards task force on photomask qualification terminology

January 2004 update on the SEMI standards task force on photomask qualification terminology

Author(s):: Jonckheere, R. M. ( IMEC(Belgium) )
Publication title:: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5504
Pub. Year:: 2004
Page(from):: 70
Page(to):: 74
Pages:: 5
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819454379 [0819454370]
Language:: English
Call no.:: P63600/5504
Type:: Conference Proceedings

Details

TDL ID:	ZA00014705
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2004 : 20th
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2004.01.12-2004.01.14

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