Determining the transfer function of a mask fabrication process

Determining the transfer function of a mask fabrication process

Author(s):

Leunissen, P. L. H. A. ( IMEC(Belgium) )
Philipsen, V. ( IMEC(Belgium) )
Jonckheere, R. M. ( IMEC(Belgium) )

Publication title:

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5504

Pub. Year:

2004

Page(from):

36

Page(to):

45

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454379 [0819454370]

Language:

English

Call no.:

P63600/5504

Type:

Conference Proceedings

Details

TDL ID:	ZA00014705
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2004 : 20th
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2004.01.12-2004.01.14

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