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Hard pellicle investigation for 157-nm lithography: impact on overlay

Author(s):
Bruls, R. ( ASML(Netherlands) )
Uitterdijk, T. ( ASML(Netherlands) )
Cicilia, O. ( ASML(Netherlands) )
De Bisschop, P. ( IMEC(Belgium) )
Kocsis, M. K. ( Intel Corp. /International SEMA TECH(USA) )
Grenville, A. ( Intel Corp. /International SEMA TECH(USA) )
Van Peski, C. K. ( International SEMA TECH(USA) )
Engelstad, R. L. ( Univ. of Wisconsin/Madison(USA) )
Chang, J. ( Univ. of Wisconsin/Madison(USA) )
Cotte, E. P. ( Univ. of Wisconsin/Madison(USA) )
Okada, K. ( Asahi Glass Co. , Ltd. (Japan) )
Ohta, K. ( Asahi Glass Co. , Ltd. (Japan) )
Mishiro, H. ( Asahi Glass Co. , Ltd. (Japan) )
Kikugawa, S. ( Asahi Glass Co. , Ltd. (Japan) )
9 more
Publication title:
20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5504
Pub. Year:
2004
Page(from):
1
Page(to):
11
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819454379 [0819454370]
Language:
English
Call no.:
P63600/5504
Type:
Conference Proceedings

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