Study on EUV emission properties of laser-produced plasma at ILE, Osaka

Study on EUV emission properties of laser-produced plasma at ILE, Osaka

Author(s):

Nakai, M. ( Osaka Univ. (Japan) )

Nishimura, H. ( Osaka Univ. (Japan) )

Shigemori, K. ( Osaka Univ. (Japan) )

Miyanaga, N. ( Osaka Univ. (Japan) )

Norimatsu, T. ( Osaka Univ. (Japan) )

Nagai, K. ( Osaka Univ. (Japan) )

Matsui, R. ( Osaka Univ. (Japan) )

Hibino, T. ( Osaka Univ. (Japan) )

Okuno, T. ( Osaka Univ. (Japan) )

Sohbatzadeh, F. S. ( Osaka Univ. (Japan) )

Tao, Y. ( Osaka Univ. (Japan) )

Hashimoto, K. ( Osaka Univ. (Japan) )

Yamaura, M. ( Osaka Univ. (Japan) )

Fujioka, S. ( Osaka Univ. (Japan) )

Nagatomo, H. ( Osaka Univ. (Japan) )

Zhakhovskii, V. ( Osaka Univ. (Japan) )

Nishihara, K. ( Osaka Univ. (Japan) )

Uchida, S. ( Osaka Univ. (Japan) )

Shimada, Y. ( Osaka Univ. (Japan) )

Furukawa, H. ( Osaka Univ. (Japan) )

Nakatsuka, M. ( Osaka Univ. (Japan) )

Izawa, Y. ( Osaka Univ. (Japan) )

17 more

Publication title:

Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5196

Pub. Year:

2004

Page(from):

289

Page(to):

297

Pages:

9

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819450692 [0819450693]

Language:

English

Call no.:

P63600/5196

Type:

Conference Proceedings

Details

TDL ID:	ZA00014633
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications
Conf. info. (Number):	2003
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2003.08.04-2003.08.06

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